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Ultra-Pure Water Systems

Electronic-Grade, EDI, Pharmaceutical & Deionized Water

≥18.2 MΩ·cm
Resistivity
≤0.5 μg/L
TOC
0.5–100 m³/h
Capacity

KONCHE provides a coordinated range of industrial ultrapure water, EDI, pharmaceutical purified-water and deionized-water systems. Each project is configured from feed-water analysis, required flow, final resistivity or conductivity, TOC and microbial targets, distribution conditions and the applicable industry standard.

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KONCHE electronic grade ultrapure water RO system for PCB and semiconductor process water
KONCHEINDUSTRIAL WATER TREATMENT SYSTEMSMODEL KONCHE EUP · ELECTRONIC GRADE ULTRAPUREEDI + TOC UVMEMBRANE DEGASSINGTERMINAL FILTRATIONENGINEERED BY KONCHE · 2026
QUICK TECHNICAL ANSWER

What is an industrial ultrapure water system?

KONCHE Ultra-Pure Water Systems: the four-system family for high-purity duties — 18.2 MΩ·cm resistivity, TOC ≤0.5 μg/L, 0.5–100 m³/h — configured to each end use.

How KONCHE scopes an ultrapure project

  • Each project is reviewed against the water-quality specification, feed analysis, flow profile and factory utilities before the process train is fixed.
  • Reference values on this page apply to stated conditions; final materials, instruments and performance guarantees are confirmed after engineering review of the complete system, loop and use points.
PRODUCT DOCUMENTATION

KONCHE provides a coordinated range of industrial ultrapure water, EDI, pharmaceutical purified-water and deionized-water systems. Each project is configured from feed-water analysis, required flow, final resistivity or conductivity, TOC and microbial targets, distribution conditions and the applicable industry standard.

Product documentation

An industrial ultrapure water system is a staged purification and polishing plant that produces water to a project-specific target. Resistivity, conductivity, TOC, particles and microbes are specified per end use. Electronic-grade KONCHE plants combine pretreatment, RO, EDI, 185 nm TOC UV, membrane degassing, polishing resin and terminal filtration. Documented reference values reach 18.2 MΩ·cm resistivity with TOC ≤0.5 μg/L across a 0.5–100 m³/h capacity range. Semiconductor, PCB and display fabrication set the strictest requirements. The correct process train depends on the end use: electronics, pharmaceuticals and general industrial deionized water do not share one universal specification. The page table compares EDI, mixed-bed, pharmaceutical and deionized variants by resistivity, TOC and capacity. Polishing stages are selected against the destination standard, feed-water analysis and distribution-loop design rather than resistivity alone.

01

What it is

An ultrapure system combines RO pretreatment with EDI or a polishing mixed bed, UV and terminal filtration to remove ions, organics, particles and microorganisms.

02

How it is used

Pretreated water passes through RO, then EDI or polishing resin, UV and a terminal filter. Water quality is monitored and consumables are replaced routinely.

03

Where it fits

Semiconductors and electronics, biopharmaceutical production, precision analysis, pharmaceutical processes, research and fine chemicals.

04

Effectiveness

Under suitable conditions, product-water resistivity can reach 18.2 MΩ·cm. Poorer feed water or exhausted consumables can lower final-water quality.

05

Energy consumption

Typical complete-system electricity use is about 1–2 kWh/m³. Exact demand varies with feed water, pressure and the selected process train.

06

Cost

Costs include the equipment purchase, polishing resin, cartridges, UV lamps and servicing. Poorer feed water usually shortens consumable replacement intervals.

PRODUCT FAMILY

01

Industrial ultrapure water

Pretreatment, double-pass RO, EDI, UV and optional polishing for electronic-grade process water up to 18.2 MΩ·cm.

02

EDI ultrapure water

Continuous electrodeionization after RO for stable 15–18.2 MΩ·cm water without routine acid-and-caustic resin regeneration.

03

Pharmaceutical purified water

Hygienic RO + EDI generation, storage and circulation configured around the applicable pharmacopoeia, GMP and validation plan.

04

Deionized water

Mixed-bed ion exchange for 1–10 MΩ·cm industrial pure water where lower investment is prioritized and chemical regeneration is acceptable.

CONFIGURATION COMPARISON

SystemOfficial reference targetOfficial capacity rangeTypical applications
Industrial ultrapure waterResistivity ≥18.2 MΩ·cm; TOC ≤0.5 μg/L0.5–100 m³/hSemiconductor, PCB, display, photovoltaic and battery production
Industrial Ultrapure Water SystemResistivity 15–18.2 MΩ·cm; TOC ≤0.5 μg/L0.5–100 m³/hElectronics, pharmaceutical pretreatment, power and precision processes
Industrial Ultrapure Water SystemConductivity ≤2 μS/cm; TOC ≤500 ppb; microbes ≤100 CFU/mL0.5–20 m³/hPharmaceutical production, medical-device cleaning and QC laboratories
Industrial Ultrapure Water SystemResistivity 1–10 MΩ·cm0.5–100 m³/hBoiler make-up, surface treatment, chemicals and general industrial cleaning

INDUSTRY APPLICATIONS

IndustryWater useDesign priority
Semiconductor and integrated circuitsWafer cutting, lithography, etching and cleaningIonic, TOC, particle and microbial control
PCB and electronic componentsEtching, copper deposition, plating and final rinseLow ionic residue and particle control
Photovoltaic and batteriesWafer cleaning, coating, material preparation and equipment rinseStable high-purity water and continuous operation
Display and precision opticsPanel, lens and precision-component cleaningLow particles, low residue and water-mark control
Biopharmaceutical and medical devicesProcess water, equipment rinse and purified-water generationHygienic design, monitoring and validation
Fine chemicals and power generationFormulation, reaction solvent and boiler make-upIonic control, stable production and operating cost

PROJECT INPUTS

01

Feed-water analysis

Provide conductivity or TDS, hardness, silica, alkalinity, organics, turbidity, temperature and any known contaminants.

02

Final-water specification

Confirm resistivity or conductivity, TOC, particles, microbes, silica and the applicable process or regulatory standard.

03

Capacity and operating profile

Provide average and peak demand, hours per day, redundancy requirement, storage volume and future expansion.

04

Distribution and utilities

Confirm loop length, return conditions, materials, power supply, available space, drainage, compressed air and sanitization requirements.

FAQ

How do I choose between EDI and a mixed bed?

EDI supports continuous deionization without routine acid-and-caustic regeneration and is normally selected for long-term high-purity production. A mixed bed can reduce initial investment but requires chemical regeneration and waste handling.

Is 18.2 MΩ·cm required for every industrial process?

No. The target should follow the actual process. Some boiler, chemical and rinsing applications need 1–15 MΩ·cm, while critical electronic processes may require 18.2 MΩ·cm plus TOC, particle and microbial limits.

Is the polishing mixed bed mandatory after EDI?

Not always. It is selected when the final resistivity, TOC, silica, continuity or risk-control requirement justifies an additional polishing barrier.

What information is needed for a quotation?

Send the feed-water analysis, required capacity, final-water target, application, operating schedule, point-of-use information, power standard and site constraints.

WHY KONCHE

01

Nearly 30 years of expertise

Since 1997, Konche has accumulated practical experience across raw-water conditions, treatment processes and industrial project delivery.

02

Professional customization

Each system is designed around the water analysis, industry standard, site condition, capacity and final use.

03

Controlled system quality

Component selection, factory testing, water-quality verification and process control are managed as one complete system.

04

Full-cycle technical service

KONCHE supports proposal alignment, technical documentation, consumables supply, maintenance guidance and remote operational clarification.

PROJECT INQUIRY

Define the required
water quality.

Send KONCHE your source-water analysis, required capacity, target resistivity or conductivity, TOC requirement, application and point-of-use information.

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